
With the rapid development of AI large models and high-performance computing, HBM high-bandwidth memory, high-end AI chips, and Chiplet heterogeneous integration have become the core directions of the semiconductor industry. The evolution of Moore's Law has shifted from planar miniaturization to 3D vertical integration. Wafer bonding is precisely the core pillar process for achieving 3D chips, heterogeneous material integration, and advanced packaging. In the wafer bonding process, the high-precision alignment of wafers is the control line that determines the success or failure of the process, the performance of the chip, and the yield of mass production. The alignment accuracy requirements of advanced bonding processes are moving towards higher precision. Even a few nanometers of alignment deviation can lead to chip scrapping, device performance failure and reduced reliability. The core of achieving nanoscale alignment is precisely the piezoelectric nanoscale positioning stage that can help the wafer adjust its pose.
Ⅰ.Wafer Bonding
(1)
1
3D Integration: Vertically stack chips with different functions, significantly enhancing integration and data transmission speed;
2
Heterogeneous Integration: Seamlessly combining wafers of different materials (such as GaN, Si, etc.) to achieve complementary advantages
3
Advanced Packaging: Prepare special structures such as SOI wafers and MEMS vacuum chambers, and significantly improve mass production yield and reduce manufacturing costs through wafer-level packaging.

(Note: image from online resouces)
(2)
1
Surface Pretreatment: Through processes such as chemical cleaning and plasma activation, the wafer surface is atomically leveled to remove impurities and defects.
2
Precise Alignment: Precisely align the alignment marks on the two wafers to ensure the correctness of subsequent electrical connections;
3
Precise Alignment: Precisely align the alignment marks on the two wafers to ensure the correctness of subsequent electrical connections;
4
Annealing Strengthening: By heating at high temperatures, strong covalent bonds are formed between atoms, thereby permanently bonding two wafers together.
5
Quality Inspection: Test the bonding strength, alignment accuracy and reliability.

(Note: image from online resouces)
(3)
Among the numerous technical indicators of wafer bonding, alignment accuracy is one of the most crucial parameters that determine the final function and performance of the chip.
Alignment accuracy is directly related to: the effectiveness of electrical interconnection, the quality of chip performance, production yield and cost.

Ⅱ.Piezo Nano-Positioning Stage
The essence of wafer precision alignment is to make nano-scale precise adjustments to the position of the wafer. The piezo nano-positioning stage is a piezo platform that uses piezo ceramics as the driving source and combines a flexible hinge mechanism to achieve multi-axis precise motion. Its core advantages lie in its small size, non-friction, and fast response speed. After being equipped with high-precision sensors, it can achieve nanometer-level resolution and positioning accuracy, and has extremely high reliability.
During the wafer bonding process, the piezo nano-positioning stage compensates for errors through multi-degree-of-freedom micro-movements and adjusts the wafer to the ideal alignment position. This process needs to simultaneously meet requirements such as high precision, high stability, and fast response. The piezo nano-positioning stage, with its unique driving and structural characteristics, is a core standard component for wafer bonding alignment and attitude adjustment.
Core Technical Advantages of CoreMorrow Piezo Nano-Positioning Stage
(1)Nano-scale Positioning Accuracy:The piezo nanometer-level positioning stage directly converts electrical signals to displacement through the inverse piezoelectric effect, with resolution and positioning accuracy reaching the nanometer level, fully meeting the requirements of advanced wafer bonding for sub-micron and even nanometer-level alignment.
(2)Millisecond Response:The response time of piezo nano-positioning stages is usually in the millisecond range, capable of compensating for displacement deviations in real time. During the wafer bonding process, the piezo nano-positioning stage can quickly fine-tune the wafer position, avoiding alignment failure caused by adjustment lag.
(3)Frictionless:The piezo nano-positioning stage adopts a frictionless flexible hinge mechanism design, featuring zero-gap transmission, high guiding accuracy, high resolution, and long-term stability.
(4)Multi-axis Coordinated Motion Capability:Wafer alignment requires simultaneous adjustment of multiple degrees of freedom, including multi-axis linear and rotational movements. However, the piezo nano-positioning stage can achieve precise motion in three or even six axes.
(5)High Stability and Reliability:The high rigidity and zero-gap design of the piezo nano-positioning stage ensure the stability and repeatability of the system during operation, making it a reliable platform for carrying wafers.
Product Recommendation
CoreMorrow H30 Piezo Nano-Positioning Stage
CoreMorrow H30 is a 3-axis piezo tip/tilt stage with a central through hole and can achieve XY linear motion and θz rotation. It adopts a frictionless flexible hinge structure design, featuring fast response speed and high closed-loop positioning accuracy, which can meet the adjustment requirements during the wafer alignment process.

Technical Data
|
Model |
H30.XY100R2S/K |
|
Active axis |
X、Y、θz |
|
Drive control |
4 driving channels, 3 sensing channels/4 driving channels |
|
Nominal linear travel (0~120V) |
±56/axis |
|
Linear travel (0~120V) |
±70/axis |
|
Nominal rotation angle (0~120V) |
1.6(≈330”) |
|
Rotation angle (0~150V) |
2(≈413”) |
|
Sensor |
SGS/- |
|
XY resolution |
6nm/2nm |
|
θz resolution |
0.3μrad(≈0.06”)/0.1μrad(≈0.02”) |
|
XY Repeatability |
X0.057%F.S.、Y0.018%F.S./- |
|
θz Repeatability |
0.03%F.S./- |
|
Unloaded resonant frequency |
XY450Hz、θz330Hz |
|
Loaded resonant frequency@6kg |
XY110Hz、θz85Hz |
|
El.capacitance |
XY15μF、θz28.8μF |
|
Step time |
150ms@6kg/5ms |
|
Load capacity |
6kg |
|
Material |
Al |
|
Mass (without cable) |
2.3kg |
Wafer Bonding Alignment Nanomatron

Technical Data
Active axis: X, Y, θz
Travel: XY>100μm/axis, θz>0.2mrad
Nanometer-level resolution
Load capacity: >10kg
Optional vacuum version
Custom service available
For further details, please call +86-451-86268790, or add WeChat ID: 17051647888.

